金属薄膜/有机材料基体系激光刻蚀研究(英文)  

Laser Ablation the Combination of Metal Film/Organics Material

作　　者：王瑞[1] 陈学康[1] 任妮[1] 吴敢[1] 杨建平[1] 曹生珠[1] 

机构地区：[1]兰州空间技术物理研究所表面工程技术重点实验室,甘肃兰州730000

出　　处：《稀有金属材料与工程》2013年第S2期240-242,共3页Rare Metal Materials and Engineering

基　　金：NSFC(51135005)

摘　　要：激光刻蚀技术用于卫星天线的制造,用于刻蚀由不同材料体系组成天线表面的金属薄膜,由于金属、有机材料各层对激光的热和光物理特性存在很大的差异,因而每层材料的物理特性对激光刻蚀的结果产生影响。基于在多层材料表面金属薄膜激光刻蚀的物理机制,通过讨论和分析实验结果,发现激光刻蚀的物理过程主要受有机材料和金属薄膜之间界面效应的影响,为获得锐利和对有机材料无损伤的刻蚀效果,在金属薄膜和有机材料之间增加厚度约为200 nm的Cr过渡层可提高激光刻蚀的质量,而界面处的有机过渡层应选择对刻蚀激光波长高透过率的材料。The technique of laser ablation is used in the fabrication of satellite antenna which consists of multi-layer materials that each layer presence different physical properties of thermal and optic.So the physics properties of each layer material will influence the result of laser ablation.On the basis of the mechanism that laser ablate metal film on the surface of multi-layer material/substrate,through discussing and analyzing the experimental results,we found that the physics course of laser ablating is influenced by the interface effect between metal film and organic material.In order to obtain sharp border and non-traumatic to organic substrate,the metal Cr buffer layer that the thickness is about 200nm may improve the quality of ablation; the organic buffer layer should choose the material that its absorption is low to the wavelength of processing laser.

关 键 词：激光刻蚀 界面效应 金属薄膜过渡层 

分 类 号：TG665[金属学及工艺—金属切削加工及机床] V443.4[航空宇航科学与技术—飞行器设计]