热处理及SmCo磁性层对TbDyFe 薄膜磁致伸缩性能的影响  

The Effect of a SmCo Layer and Annealing on the Magnetostricion of TbDyFe Thin Films

作　　者：万红[1] 邱轶[1] 斯永敏[1] 赵恂[1] 

机构地区：[1]国防科技大学,湖南长沙410073

出　　处：《稀有金属材料与工程》2004年第7期759-763,共5页Rare Metal Materials and Engineering

基　　金：国家自然科学基金项目(59971064)

摘　　要：研究了SmCo薄膜的复合及热处理对TbDyFe薄膜磁性及磁致伸缩性能的影响。XRD分析表明制备态的TbDyFe薄膜为非晶态,在450℃退火后,样品仍保持非晶态结构。退火处理减少了薄膜的垂直各向异性,并且退火热应力有利于薄膜的易磁化轴转向膜面,从而提高了薄膜的磁导率和TbDyFe薄膜低场下的磁致伸缩值。磁控溅射的SmCo薄膜有良好的软磁性能,它的复合也能有效地增强TbDyFe薄膜的低场磁致伸缩性能。The effects of a SmCo layer and vacuum annealing on the magnetic and magnetostrictive properties of TbDyFe thin films were investigated. X-ray diffraction shows that the microstructure of as-deposited TbDyFe film is amorphous, and no changes are discovered in the film after annealing at 450degreesC for I h. The magnetostriction tests reveal that the annealing treatment can significantly improve the magnetostrictive coefficient (lambda) and dlambda/dH of the TbDyFe thin films, especially in low magnetic fields. The addition of the SmCo layer greatly increases the magnetostriction of TbDyFe films.

关 键 词：TbDyFe薄膜 超磁致伸缩 磁控溅射 

分 类 号：TM27[一般工业技术—材料科学与工程]