半导体晶圆自动清洗设备  

Silicon Wafer Auto Clean Equipment

作　　者：王锐延 

机构地区：[1]北京七星华创电子股份有限公司,北京100016

出　　处：《电子工业专用设备》2004年第9期8-12,共5页Equipment for Electronic Products Manufacturing

摘　　要：主要介绍了半导体晶圆RCA清洗工艺以及半导体晶圆自动清洗设备在生产中的结构设计和应用情况。在工艺模块和伺服机械传送方面体现了湿法化学的独创性和实用性。解决了晶圆清洗技术中晶圆清洗效果的一致性,在半导体IC、材料、器件领域的清洗工艺中得到广泛使用,具有极大的社会经济效益。This article introduces the clean process of RCA for silicon wafer, and the design and apply in the manufacture of this kind of silicon wafer auto clean equipment. It represents creativity and practicability of wet bench in process modules and wafer servo motor transportation. It gives good yield for the clean results of wafer in uniformity. This equipment had widely utilized in semiconductor clean process such as IC, material, components etc.

关 键 词：湿法化学 工艺模块 QDR RCA清洗 

分 类 号：TN305.97[电子电信—物理电子学]