反应离子镀光学薄膜的微观结构分析  

Microstructure analysis of thin films deposited by ractive ion plating

作　　者：王建成[1] 韩丽瑛[2] 高健存[2] 

机构地区：[1]河南师范大学物理系,新乡453002 [2]清华大学现代应用物理系,北京100084

出　　处：《光学学报》1993年第10期956-959,共4页Acta Optica Sinica

摘　　要：用反应离子镀方法制备了TiO_2单层膜及TiO_2/SiO_2多层膜,用透射电子显微镜分别观察了由反应离子镀方法及传统蒸镀法二种不同工艺制得的TiO_2单层膜及TiO_2/SiO_2多层膜的断面结构,并对TiO_2单层膜进行了喇曼分析和卢瑟福背散射分析.There are distinct differences in microstructure between thin films deposited by reactive evaporation and by reactive ion plating. Cross sections of TiO2 single layer thin films and TiO2/ SiO2 multilayer stacks deposited by reactive ion plating have been investigated by transmission electron microscopy; analyses of TiO2 thin films by Raman spectroscopy and by RBS is prestented in this paper.

关 键 词：反应离子镀 光学薄膜 显微结构 

分 类 号：O484.5[理学—固体物理]