非平衡磁控溅射系统的离子束流控制  

Axial ion flux control in unbalanced magnetron sputtering system

作　　者：牟宗信[1] 李国卿[1] 黄开玉[1] 车德良[1] 

机构地区：[1]大连理工大学三束材料表面改性国家重点实验室,大连116024

出　　处：《核聚变与等离子体物理》2004年第3期225-230,共6页Nuclear Fusion and Plasma Physics

摘　　要：在非平衡磁控溅射沉积非磁性金属薄膜过程中,离子 原子到达比、沉积速率等参数是影响薄膜结构和性能的重要因素。根据非平衡磁控溅射沉积过程中离子的分布特点,分别考虑离子和中性粒子的传输,导出了对圆形平面靶非平衡磁控溅射沉积薄膜的放电功率、气压和离子束流密度等参数之间的关系,阐明了放电参数对于沉积过程离子束流密度等参数的影响。在Ar放电条件下,测量了系统的伏安特性;采用偏压平面离子收集电极测量了溅射系统轴向离子束流密度随不同的气压、溅射电流和空间位置的变化规律。结果表明模型分析的结论和实验数据的变化趋势相符合。A model has been established for indicating the relations between discharge power, pressure and ion beam flux density in the circular unbalanced magnetron system. The transportation of the ions and one of the neutral particles were separately discussed in the model. The influence of the discharge current density and pressure is discussed through the analytical model on axial ion flux density in system. The model indicates the relation between axial ion flux density and discharge parameters such as the discharge pressure, target-substrate distance and sputter current density. The experimental results are approximately in conformity with the simulation results.

关 键 词：非平衡磁控溅射系统 非磁性金属薄膜 离子束流控制 放电参数 放电功率 

分 类 号：TL656[核科学技术—核技术及应用] TB43[一般工业技术]