碳氮薄膜的制备及其拉曼光谱研究  

Raman scattering of CN thin film grown using arc plasma

作　　者：闫永辉[1] 冯贤平[2] 施芸城[1] 唐晓亮[1] 

机构地区：[1]东华大学物理系,上海200051 [2]波多黎各大学物理系,圣胡安009313343

出　　处：《物理实验》2004年第9期16-19,共4页Physics Experimentation

基　　金：上海市科学技术发展基金项目 (No .0 2 5 2nm110 ) ;教育部科学技术研究重点项目 (No .0 30 77)

摘　　要：使用自行设计的真空系统 ,采用弧光放电等离子体的方法 ,成功制备了表面光滑致密的碳氮薄膜 .牛顿环干涉图样进一步验证了薄膜厚度的均匀性 .拉曼光谱显示了 3个主要的散射峰和几个相对较弱的峰 ,拉曼光谱分析表明 ,膜的结构是一种无定形非晶碳氮膜 ,碳原子与氮原子在薄膜中以各种不同的键态存在 .通过比较样品不同区域的拉曼光谱图发现 ,谱图几乎没有变化 。Using arc discharge, CN thin film has been grown in our laboratory. The surface of the film is smooth and compact, which is confirmed by the pattern of Newton ring. The Raman spectrum of film shows three main scattering bands and several weak bands. Experimental data indicate that the carbon and nitrogen atoms in the film are in various bonding states, and the structure of the film is amorphous. The spectral patterns of thin films grown at different places are almost unchanged. This indicates that the structure of CN film is homogeneous and arc discharge is a way to prepare the uniform film.

关 键 词：碳氮薄膜 弧光放电 拉曼光谱 发射光谱 红外光谱 

分 类 号：O484.41[理学—固体物理]