应用相移干涉云纹检测变线距光栅密度  

Measurement of Varied-line-space Grating Density by Phase-shift Moiréinterferometry

作　　者：王铷[1] 唐欣[1] 张天林[1] 王迪[1] 何世平[1] 

机构地区：[1]中国科学技术大学力学和机械工程系,安徽合肥230027

出　　处：《中国科学技术大学学报》2004年第5期568-574,共7页JUSTC

基　　金：国家自然科学基金 (10 2 72 0 98)资助项目

摘　　要：相移干涉云纹法被用于检测变线距全息光栅线密度的全场分布 .首先求出全场每个像素点的条纹级数 ,再利用最小二乘法将全场实验数据拟合成光滑的二维曲面 ,进而求出光栅密度的全场二维分布 .介绍了二维光栅密度的表述方法、相移干涉云纹法的检测原理及实验数据的处理步骤 ,推导出了相应的公式 .文中用不同的检测方法对同一个光栅的线密度进行了检测 。Phase-shift Moiréinterferometry is used to detect the whole field distribution of the line density of the varied-line-space grating holographically recorded. The fringe series on each image element of the whole field is measured,the experiment data of the whole field is then fitted to a two-dimension smooth curved face by using least-squares procedure and the two-dimension density distribution on the whole field of the grating is gained. In the study, the expression of two-dimension grating density, the detection theory of phase-shift Moir interferometry and the treated process of experiment data are introduced,and the related formulas are deduced. To discuss the experimental errors,different measurement methods are used to detect the line density of the same grating.

关 键 词：变线距全息光栅 线密度 相移干涉云纹 条纹图处理 

分 类 号：TH741[机械工程—光学工程]