磁流变抛光光学非球面元件表面误差的评价  

Evaluation on the figure errors of optical aspheric surfaces after magnetorheological polishing

作　　者：程灏波[1] 冯之敬[1] 王英伟[2] 

机构地区：[1]清华大学精密仪器与机械学系,北京100084 [2]长春理工大学材料工程系,长春130022

出　　处：《清华大学学报（自然科学版）》2004年第11期1497-1500,共4页Journal of Tsinghua University(Science and Technology)

基　　金：国家自然科学基金资助项目(50175062);国家博士后基金资助项目(2003034142)

摘　　要：正确评价抛光后光学非球面元件表面面形的波前畸变是确保实现光学非球面元件超精密制造的关键。该文提出了结合功率谱密度法和残余误差法并考虑非球面元件表面中频误差的综合评价方法。将提出的综合评价标准应用到磁流变数控抛光过程中,进一步明确了表面残余误差与抛光工艺参数之间的关系,建立了有效消除表面残余误差的抛光工艺规范。按照这一工艺规范制造出一块抛物面光学反射镜,其面形精度达到λ/30(λ=0.6328μm),残余误差为3λ/1000。该方法可为深入开展高精度磁流变抛光技术研究提供参考。A method combining power spectral density PSD and residual errors evaluation was developed to accurately evaluate the residual figure errors on aspheric surfaces after polishing. By applying the PSD and residual errors evaluation criterion to the magnetorheological polishing MRP process, the relationship between residual errors and polishing processes was determined, which is helpful to establish the MRP model. A parabolic mirror was manufactured according to the criterion with a final figure accuracy up to 1/30 of the wavelength λλ=0.632 8 μm and residual errors less than 3/1 000 of λ. Experimental results indicate that the method can provide wider control degrees of freedom for decreasing figure errors during fabricating aspheric components by MRP.

关 键 词：干涉仪 抛光 非球面 空间频率 功率谱密度 

分 类 号：TH744.3[机械工程—光学工程]