集成光学制备工艺中的清洗和腐蚀  

Preparation Skill for Rinse and Corroding of Integration Optical

作　　者：郭亚明[1] 

机构地区：[1]北京航空航天大学光电技术研究所,北京100083

出　　处：《半导体技术》2005年第1期32-34,共3页Semiconductor Technology

摘　　要：论述了集成光学光刻、镀膜工艺中对基片的清洗步骤,阐述了常规材料的腐蚀方法及腐蚀液配制,并分析了腐蚀工艺过程中易出现的问题。Integration optical photolithography and the cleaning steps of in depositing film skill are discussed. The sculpture method of general materials and sculpture confection are expounded. The reasons of these problems which appeared easily in the process of etching preparation are analyzed.

关 键 词：超声波清洗 干法/湿法腐蚀 浮胶 晶片再生 

分 类 号：TN305.97[电子电信—物理电子学]