光刻胶掩膜微细电化学加工参数的试验研究  

Key technique of photoresist through-mask Electrochemical micromachining

作　　者：李嘉珩[1] 马保吉[1] 范植坚[1] 

机构地区：[1]西安工业学院机电工程学院,陕西西安710032

出　　处：《电加工与模具》2004年第6期17-19,共3页Electromachining & Mould

摘　　要：对光刻胶掩膜微细电化学加工参数进行了试验分析研究 ,发现光刻胶厚度、开口角度、脉冲电源频率、脉宽及电解液配方对加工质量都有影响 ,在此基础上提出改善加工质量的可行性方案。Electrochemical micromachining (EMM) appears to be a promising technique, since in many areas of application, it offers several special advantages that include higher machining rate, better precision and control, and a wider range of materials that can be machined. This paper show that principle of EMM and the influence of EMM parameters on machining product.

关 键 词：微细电化学加工 加工质量 开口 厚度 角度 试验分析 电解液 光刻胶 掩膜 脉宽 

分 类 号：TH457[机械工程—机械制造及自动化] TG661[金属学及工艺—金属切削加工及机床]