射频磁控溅射方法制备氧化钒薄膜的研究  

Studies of Vanadium Oxide Thin Films Prepared by R.F.Magnetron Sputtering Methods

作　　者：李志栓[1] 李静[1] 吴孙桃[1] 郭东辉[1] 徐富春[2] 

机构地区：[1]厦门大学萨本栋微机电研究中心 [2]厦门大学分析测试中心,福建厦门361005

出　　处：《厦门大学学报（自然科学版）》2005年第1期37-40,共4页Journal of Xiamen University：Natural Science

基　　金：国家自然科学基金重大研究计划(90206039);国家重点基础研究发展规划(2001CB610505);福建省自然科学基金(E0110004)资助

摘　　要：利用射频磁控溅射的方法,在不同的衬底温度和溅射功率下制备了氧化钒薄膜样品,并在纯氩气环境下作了退火处理,用X射线衍射(XRD)、X射线光电子能谱(XPS)和激光扫描共聚焦显微镜扫描图像,对样品进行研究.XRD分析显示退火前样品为非晶态,退火后为结晶态,并用激光共聚焦显微镜对图像做了验证.对比退火后样品的 XRD图谱显示在其它条件相同时,可以通过增大溅射功率或降低衬底温度,来提高退火后薄膜样品的结晶程度,并增强 V2O5(001)晶面的取向性;通过对比退火前样品的XPS谱可知在其它条件相同时,通过升高衬底温度或减小溅射功率,可以提高薄膜样品中高价钒的含量.The vanadium oxide thin films have been prepared by R.F.magnetron sputtering at different substrate temperatures and sputtering powers,then annealed in the ambient of pure Ar.The samples have been investigated by X-ray diffraction,X-ray photoelectron spectroscopy,and the Laser Scanning Confocal Microscope images.XRD analysis exhibits that the samples show amorphous state before annealing and crystalline state after annealing,which is validated by the images of the Laser Scanning Confocal Microscope.Comparing the XRD patterns of the samples after annealing,we can find that better crystalline states and better crystalline orientation with V_2O_5 (001) after annealing can be obtained through properly decreasing substrate temperature or increasing sputtering power;Comparing the XPS spectra of the samples before annealing,we can find that the proportions of high valence vanadium oxides can be increased by properly increasing substrate temperature or reducing sputtering power.

关 键 词：氧化钒薄膜 衬底温度 射频磁控溅射方法 氩气环境 XPS谱 X射线光电子能谱(XPS) 取向性 制备 并用 增强 

分 类 号：O484[理学—固体物理] O657[理学—物理]