多腔薄膜梳状滤波器中心波长温度稳定性分析  

Analysis of the Temperature Stability of Center Wavelength for the Thin Film Interleaver with Multicavity

作　　者：陈海星[1] 顾培夫[1] 李海峰[1] 章岳光[1] 吕玮阁[1] 金波[1] 

机构地区：[1]浙江大学现代光学仪器国家重点实验室,杭州310027

出　　处：《光学学报》2005年第1期105-108,共4页Acta Optica Sinica

摘　　要：利用高桥模型详细分析了多腔薄膜梳状滤波器的中心波长温度稳定性问题.发现由于多腔薄膜梳状滤波器的固体腔较厚而反射镜膜系的厚度相对较薄,因此膜系与固体腔之间的温度引起的弹性应力导致的膜系光学常数的变化已经不是主要影响因素,而固体腔材料的折射率温度系数引起的中心波长漂移对整个器件的影响较大.计算表明对于一个密集波分复用中使用的100G信道间隔的三腔薄膜梳状滤波器而言,当固体腔材料(熔融石英)的折射率温度系数为1×10-5/℃时,器件的中心波长漂移在-40℃～85℃的温度范围内可达±1 nm.The analysis on the temperature stability of center wavelength for the thin film interleaver with multicavity by Takahashi model is presented. It is found that the change of optical constant caused by the interactional elastic force between the reflector thin film stack and the cavity with the temperature change is not the main reason affecting the shift of center wavelength of the device, however, the temperature coefficient of the refractive index of cavity material is the important factor. The simulated calculation showed that the total shift of the device with the temperature vibration from-40°C to 85°C would reach ±1 nm or so for a three-cavity thin film interleaver used in dense wavelength division multiplexer (DWDM) with 100 G channel interval.

关 键 词：薄膜光学 梳状滤波器 高桥模型 温度稳定性 

分 类 号：O484.4[理学—固体物理]