电子束曝光机的偏转系统  

Deflection system for electron beam lithography

作　　者：刘珠明[1] 顾文琪[1] 

机构地区：[1]中国科学院电工研究所,北京100080

出　　处：《光电工程》2004年第12期12-16,共5页Opto-Electronic Engineering

基　　金：中科院知识创新工程重大项目支持(KGCX1-Y-8)

摘　　要：电子束曝光机的偏转系统控制电子束偏转扫描。像差低、偏转灵敏度高、扫描速度快是它的基本要求。对各种偏转器、偏转方式进行分析、比较,从偏转器空间场的数值计算方法、偏转系统的优化、像差校正、偏转器制作工艺、电气参数等方面阐述设计过程和工程实现上一些值得注意的问题。综合考虑偏转器和偏放电路的设计可以得到最优性能的系统。The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam. The basic demands of the system should be of low aberration, high deflection sensitivity and fast scanning speed. Analysis and comparison for various deflectors and deflection modes are carried out. The design process and some problems that must be paid attention in engineering stage are described from numerical calculation of deflector spatial field, optimization of the deflection system, aberration correction, manufacturing process of deflector and electrical parameters, etc. A system with optimal performance can be obtained through comprehensively taking account of the design of deflector and deflection-amplification circuit.

关 键 词：偏转器 优化设计 动态校正 电子束曝光机 

分 类 号：TN305[电子电信—物理电子学]