刻蚀衍射光栅解复用器的偏振色散分析  

Polarization Dispersion Analysis for Etched Diffraction Grating Demultiplexer

作　　者：庞冬青[1] 宋军[1] 何赛灵[1] 

机构地区：[1]浙江大学现代光学仪器国家重点实验室

出　　处：《Journal of Semiconductors》2005年第1期133-137,共5页半导体学报（英文版）

基　　金：国家自然科学基金资助项目 (批准号 :90 10 10 2 4;60 2 770 18)~~

摘　　要：介绍了一种将矩量法应用于刻蚀衍射光栅解复用器设计分析的偏振敏感型方法 .通过数值分析 ,证明提供的方法在分析器件色散响应方面比传统的标量方法更加接近实测结果 .分析了器件的偏振独立损耗和偏振色散差随入射角和衍射级的变化关系 ,指出器件结构参数的确定应以满足偏振色散差的实际需要为主 。A design and simulation method based on the method of moment (MoM) is proposed for an etched diffraction grating (EDG) demultiplexer.The method of moment is used to calculate the surface current,which produces the diffracted field at the image plane,for both polarizations.Some misplaying at the aspect of the chromatic dispersion characteristic are analyzed using a conventional scalar design for an EDG demultiplexer.It is shown that the primary structure parameters (i.e. the incident angle and the diffraction order) influence the difference of the chromatic dispersions between both polarizations more than the polarization dependent loss.However,when a uniformity of the passband is considered,the structure parameters are obtained mainly based on the characteristic of the polarization dependent loss.

关 键 词：波分复用 解复用器 刻蚀衍射光栅 矩量法 色散 偏振 

分 类 号：TN256[电子电信—物理电子学]