磁控溅射Ti合金薄膜结构特征及贮氢性能  

The structure and hydrogen storage characteristic of magnetron sputtering Ti-base alloy films

作　　者：马爱华[1] 郑华[1] 刘实[1] 王隆保[1] 

机构地区：[1]中国科学院金属研究所

出　　处：《材料研究学报》2005年第1期64-71,共8页Chinese Journal of Materials Research

基　　金：国家自然科学基金资助项目50131050~~

摘　　要：采用磁控溅射方法制备了Ti膜及TiMo、TiMoYAl和TiZrYAl等三种合金膜.合金膜中Mo、Zr和Al三种元素成份与靶材成分基本一致,而Y元素则与靶材成分有较大的偏差.在400℃吸氢工艺下,四种膜材的吸氢动力学性能良好,没有脱膜现象,饱和吸氢量均可超过1.5(H/M).膜材的吸氢PCT曲线表明,含Mo合金膜材具有最高的吸氢平衡压,外推出的室温下的数量级约为10-4Pa.The magnetron sputtering method was used to prepare Ti-base alloy films. The concentration of the alloy elements such as Mo, Zr and Al in the films is consistent with that in the targets, while the Y concentration has a large deviation from that in the targets. The hydrogen absorption dynamics of the four films at 673 K is fine and the TiZrYAI film has the best hydriding activity. The hydrogen storage capacities of all the four films exceed 1.5 (H/M). The hydrogen absorption P-C isotherms of the films were measured. The films alloying with Mo have the highest hydrogen absorption equilibrium pressure, which is determined as about 10-4 Pa at ambient temperature.

关 键 词：金属材料 磁控溅射 Ti合金薄膜 贮氢 

分 类 号：TB383[一般工业技术—材料科学与工程]