利用高频溅射刻蚀光刻伺服盘工艺参数的确定  

PROCESS PARAMETERS DETERMINATION OF ETCHING LITHOGRAPHY SERVO DISK BY HF SPUTTERING

作　　者：胡学骏[1] 赵永龙[1] 张江陵[1] 

机构地区：[1]华中理工大学计算机系,430074

出　　处：《微细加工技术》1993年第3期52-57,共6页Microfabrication Technology

基　　金：国家自然科学重点基金

摘　　要：光刻伺服盘是一种新的磁头伺服定位技术。本文分析了利用高频溅射法刻蚀光刻伺服盘的刻蚀机理,并对主要的刻蚀参数如溅射电压、气体压力等对刻蚀精度的影响作了比较详细的讨论。Lithography servo disk is a new servo locating technique for magnetic head. The mechanism of etching lithography servo disk by means of HF sputtering is analyzed.And the influence of main etching parameters, such as sputtering voltage, gas piessure etc., on the etching accuracy is discussed in more detail.

关 键 词：光刻伺服盘 高频溅射 刻蚀 工艺参数 

分 类 号：TN305.7[电子电信—物理电子学]