用ESCA分析等离子体处理了的氟树脂表面  

Surface Analysis for Mocrowave Plasma Treated Fluororesins by ESCA

作　　者：(纟户)村知之 冈田义克 藤井正之 李坤福[2] 

机构地区：[1]日本岐阜大学工学部 [2]成都科技大学高分子研究所

出　　处：《粘接》1993年第5期1-6,共6页Adhesion

摘　　要：用微波炉产生的微波对氟树脂进行等离子体处理,用ESCA作了表面分析。处理后的试样在533eV处出现O_(1S)的一大峰,在292eV～285eV间出现C_(1S)的连续宽谱带。氧的导入量随着处理时容器内气压(P)的降低而增大,可见随着P的降低处理的效果增大。为了得到深度方向的分布,采用了氩离子剥蚀法和掠射法。随着剥蚀的进行,由等离子体处理所导入的氧急剧减少。用掠射法测定了刚经过处理的FEP和处理后放置了70小时后的FEP的深度分布。刚处理后的试样,氧量随出射角(θ)的减少(即随分析深度的减小)而增大,氟量则减小。相反,处理后放置70小时,在15°<θ<60°的范围内,氟量增加,氧量减少。这是因为低表面自由能的含氟键段移动到表面上所致。由深度方向的分布的结果可以推断,等离子体处理的效果达到了ESCA在θ=90°的分析深度的一半左右。Three fluororesins (PDVF. PTFE and FEP) were treated with the microwave plasmas which generaed by an electronic cooking range and the surfaces of treated resins were analyzed with ESCA. The large signal of O_(IS) at 533 ev and the broad continuous spectrum of C_(IS) from 295 to 285 ev appeared in the ESCA spectrums for plasma treated resins. The amount of oxygen, which was introduced by the treat- ment. increased with the lowering of gas pressure in the plasma treating glass vessel. It was shown that the resin was treated more effectively by the lower the treating gas pressure. In order to obtain the depth profiles, two techniques were employed: (i) argon ion etching and (ii) by varying the electron take-off angle (θ). (i) The oxygen introduced by plasma treatment decreased rapidly with the going on of the ablation caused by the etching. (ii) For the FEP imediatly after the treatment, the amount of oxygen increased with the decreasing of θ (with the shallowing of the analyzable bepth)and fluorine decreased. After leaving the treated FEP in the des- iccator for 70 hours, the amount of fluorine increased in the region of 15°<θ<60°and oxygen decreased, since the fluorine containing segments, which had a low surface free energy, migrated to the surface of the resin. From the depth profiles, it was found that the plasma treatment reached to a half of the depth which could be analyzed by ESCA at θ=90°

关 键 词：氟树脂 微波等离子体 ESCA分析 

分 类 号：TQ325.4[化学工程—合成树脂塑料工业]