空心阴极离子镀沉积Ti(CN)的最佳工艺参数及其耐磨性能研究  

Study of the Optimum Deposition Parameters and Wear Resistance or HCD Ti(CN) coating

作　　者：陈罡[1] 谭俊[1] 朱绍华[1] 张振学[1] 

机构地区：[1]装甲兵工程学院,100072

出　　处：《表面工程》1997年第4期25-28,共4页

摘　　要：运用正交试验法进行了空心阴极离子镀（HCD）沉积Ti（CN）最佳工艺参数的研究。采用反应气体总分压、乙炔气与氮气的分压比及烘烤温度作为试验的三个变化的因素。比较了Ti（CN）、TiN及TiC的耐磨性能，结果表明Ti（CN）膜比TiC、TiN膜性能更优异。用X射线衍射（XRD）分析了Ti（CN）膜层的相结构及组成。In this paper, the optimum deposition parameters of hollow cathode deposition Ti(CN) coating were studied with the orthogonal experiment methode. The total pressure of reactive gas, the pressure ratio of acetylene to nitride and the heated temperature were the three deposition parameters in the experiment. The wear resistance of Ti(CN), TiN and TiC coatings was studied in this paper. It was discovered that the wear resistance of Ti(CN)coating was better than that of TiN or TiC coating. The composition and structure of Ti(CN) coating had been investigated by X - ray diffraction.

关 键 词：离子镀 最佳工艺参数 空心阴极 耐磨性能 膜层 相结构 分压比 反应气体 乙炔气 CN 

分 类 号：TG174[金属学及工艺—金属表面处理] TG17[金属学及工艺—金属学]