铁基体离子注入钯的腐蚀行为  

Corrosion Behaviour of Palladium Implanted Iron Substrstrates

作　　者：吴仲达[1] 王红森[1] 林文廉[1] 丁晓纪[1] 

机构地区：[1]北京师范大学化学系,北京师范大学低能核物理研究所

出　　处：《高等学校化学学报》1994年第4期561-564,共4页Chemical Journal of Chinese Universities

基　　金：国家自然科学基金

摘　　要：研究了铁基体离子注入钯后的腐蚀行为。钯离子注入剂量为１×１０^（１６）～１×１０^（１８）离子·ｃｍ^（－２），注入能量４０ｋｅＶ。在ｐＨ＝５．０的０．５ｍｏｌ／ＬＮａＡｃ／ＨＡｃ缓冲溶液中，用动电位扫描法测量了注钯后的铁的阳极溶解过程，用开路腐蚀电位与浸泡时间的关系研究了修饰材料的耐蚀性。结果表明，钯离子的注入降低了铁的临界钝化电流，在ｐＨ＝５．０的醋酸盐缓冲溶液中保持较好的钝性，但当注入电极表面的氧化膜被还原，注钯的铁的活化腐蚀速度高于未注入钯的铁。用ＡＥＳ和ＸＰＳ分析了注入样品表面的组成和元素的价态。The corrosion behavior of Pd+-implanted iron substrates was investigated.Implantation of Pd+ was performed with doses between 1 × 1016-1× 1018 ion·cm-2 at 40 keV.The anodic dissolution process of Pd+-implanted iron was measured by means of potentiokinetic sweep in a 0. 5 mol/L NaAc/HAc buffer solution with pH 5.0. The open circuit corrosion potential as a function of immersion time was used to evaluate the corrosion resistance of the modified materials. The results show that Pd+-implantation decreases the critical pa sive current of iron and maintains a better passivity in the acetate buffer solution with pH 5.0. However, the active corrosion rate of Pd+-implanted iron is higher than that of unimplanted iron when the oxide layer has been reduced. The composition and valency states of elements at the surface of the implanted samples were analyzed by AES and XPS.

关 键 词：离子注入 腐蚀 钯 铁基体 

分 类 号：TG174.1[金属学及工艺—金属表面处理]