等离子体聚合有机膜的离子注入改性  

MODIFICATION INDUCED IN PLASMA-POLYMERIZED ORGANIC FILM BY ION IMPLANTATION

作　　者：童志深[1] 周馥[1] 吴美珍[1] 浦天舒[1] 刘惠珍[1] 

机构地区：[1]中国纺织大学,中国科学院上海原子核研究所

出　　处：《高分子材料科学与工程》1994年第5期55-59,共5页Polymer Materials Science & Engineering

摘　　要：以苯胺为单体在等离子体条件下进行聚合，测量所合成的有机膜经１００ｋｅＶ、５×１０１５ｃｍ￣（－２）Ａｒ￣＋注入后电阻率的变化，并用ＦＴＩＲ、ＸＰＳ和核分析方法对离子注入引起的结构和成分改变进行了探讨。结果表明，在等离子体环境下，聚合膜内仍含有大量环结构。由于Ａｒ￣＋的注入，聚合膜表面损伤而碳化，使注入层内的体电阻率降低１１个数量级。The plasma polymerized organic films starting from aniline were prepared.After implantation of 100 keV,5×1015 cm-2 Ar+ ions,we measured the change of resistivity.The structure modifications induced by ions bomberdment were also investigated with FTIR,XPS and nuclear analysis method.Results showed that ring structures are largely survived in the plasma polymerized organic films under our experimental condition.After Ar+ implantation,the film is carbonized due to degradation.The conductive carbon-rich phases are then created in the implanted layer,it induced the drop of electrical resistivity in implanted layer by the orders of magnitude of 11.

关 键 词：等离子体 聚合 离子注入 改性 薄膜 

分 类 号：O631.1[理学—高分子化学]