100keV金属表面改性离子注入与混合两用机  

A 100 keV ion implantation and mixing machine for metal surface modification

作　　者：陈鉴璞 邱宏[1] 舒传玉 梁笳鸣[1] 李继纲 姜福友 郁庆长[1] 杜锡九[1] 竺仁全 沈本蔚[1] 魏成连[1] 

机构地区：[1]中国科学院高能物理研究所

出　　处：《核技术》1994年第1期37-41,共5页Nuclear Techniques

摘　　要：叙述了１００ｋｅＶ金属表面改性离子注入与混合两用机的总体结构及各主要部件的技术参数．该机经过调试各项主要指标已达到设计要求．工作稳定可靠，已开始金属材料表面改性实验。100 keV ion implanter for metal surface modification has been constructed. It has two functions, i.e. direct implantation of nitrogen ions with energy of tens to 100 keV into work pieces, or ion beam mixing and recoil implantation adopted for implanting non-nitrogen elements. The overall structure and major parts of the imlanter are described. After tuning the main work parameters, the machine has met the design target. The machine runs stably and reliably and several experiments on metal surface modification are being performed.

关 键 词：离子注入 金属 表面改性 离子源 

分 类 号：TG174.44[金属学及工艺—金属表面处理]