钛基体中离子注入钯的电催化性能  

The Electrocatalytic Properties of Palladium Implanted in Titanium Substrates

作　　者：王红森[1] 吴仲达[1] 林文廉[2] 丁晓纪[2] 

机构地区：[1]北京师范大学化学系,北京100875 [2]北京师范大学低能核物理研究所,北京100875

出　　处：《化学学报》1994年第11期1053-1057,共5页Acta Chimica Sinica

基　　金：国家自然科学基金资助的课题.

摘　　要：钛基体在能量40keV下,离子注入1×10^(16)～1×10^(18)Pd^+/cm^2.在30%的KOH溶液中,研究了这些电极对氢和氧析出的电催化性能.结果表明,离子注入电极的催化活性明显地优于未注入的钛基体,并随着离子注入剂量的增大,催化活性增大.由极化测量求得有关动力学参数.这些数据表明,用高剂量把离子注入的钛电极,其电化学性能与钯电极相似.根据AES和XPS数据,讨论了注入电极表面的组成.The titanium substrates were bombarded with 1xxxxxxxxxxxx1016- 1xxxxxxxxxxxx1018Pd+/ cm2 at an energy of 40 keV. The palladium-implanted electrodes were studied with respect to their electrocatalytic properties for the hydrogen and oxygen evolution reactions in 30% KOH solution. Results showed that the implanted electrodes were much more active than the untreated ones and had an increase in electrocatalytic activity with increasing implantation dose. The relative kinetic parameters were obtained by polarization measurements. These values showed that the titanium electrode implanted with high dose of palladium ions was similar to palladium electrode in these electrochemical properties. The surface compositions of implanted electrodes were discussed based on AES and XPS data.

关 键 词：钛 离子注入 钯 电催化 

分 类 号：O614.823[理学—无机化学]