光学薄膜反应离子镀技术研究  

A Study on Optical Coatings by Reactive Ion Plating

作　　者：王建成[1] 韩丽瑛[1] 高健存[1] 

机构地区：[1]河南师范大学物理系,北京清华大学现代应用物理系

出　　处：《激光与红外》1994年第1期54-57,共4页Laser & Infrared

摘　　要：光学薄膜反应离子镀技术是近年来新发展的一种光学薄膜技术。本文介绍了光学薄膜反应离子镀设备的研制，在此设备上成功地制备了ＴｉＯ２、ＺｒＯ２、ＳｉＯ２、Ａｌ２Ｏ３光学薄膜，测出其折射率接近或达到同种块状材料的折射率；并对ＴｉＯ２、ＳｉＯ２，单层膜的成份及价态作了Ｘ光电子能谱分析。Reactive ion plating deposition is a new optical coating technique.The principle and process of deposition are discussed.A low voltage are discharge plasma is combined with the electron gun to deposite the thin film on the substrate.TiO2,ZrO2,SiO2, Al2O3 thin films have been obtained by this new deposition technique. Refractive index of TiO2 thin film is 2.57, approximately approach that of the bulk material,Xray photoelectron spectrum is used to identify the composition and structure.

关 键 词：光学薄膜 反应离子镀 

分 类 号：O484.41[理学—固体物理]