微机控制的电弧等离子体光谱诊断装置  

MICRO-COMPUTER CONTROLLED SPECTROSCOPIC DIAGNOSTIC APPARATUS FOR ARC PLASMA

作　　者：韦福水[1] 宋永伦[2] 任隆良[2] 李俊岳[2] 卢元军[2] 

机构地区：[1]天津大学分校热能系 [2]天津大学机械制造工程系

出　　处：《天津大学学报》1989年第1期72-79,共8页Journal of Tianjin University(Science and Technology)

摘　　要：本文根据等离子体光谱多线解析法的基本原理,研制出了一种用微型计算机测控的光电光谱诊断装置。该装置能对未知配比的电弧等离子体中的各组分浓度以及对应的温度、压力等热力学基本参数及其分布进行同时测定;并具有快速、定量、时间与空间分辨率高、信息量大以及操作简便优点。大大地扩大了传统的光谱诊断装置的测试功能和测试范围,为电弧等离子体的热力学分析、加工过程的自动控制和污染的防治等提供了必要的前提。本装置已用于二元及多元混合气体电弧等离子体、高频直流脉冲电弧等离子体的诊断。本文将着重介绍该装置的原理、结构、性能及使用情况;并以氩氢电弧为例,给出测试的结果及误差估计。On the basis of plasma physics and optical spectroscopy, a microcomputer controlled new spectroscopic apparatus was developed, which can simultaneously measure the component densities and the basic thermodynamical parameters such as the corresponding temperature, pressure and their dis tributions in mixed gases arc plasma. Characterized by on-line, real-time, quantitatively recording, high resolution in both space and time, great storage of information and easy-operation, this apparatus has a greatly expanded capacity of measurement compared with the traditional spectralline diagnostic apparatus and is then a necessary preparation for arc plasma thermodynamics analysis, automatic process control as well as pollution prevention.Multicomponent arc plasma, such as Ar+H_2, Ar+O_2, Ar+O_2+H_2 and high frequency D. C. pulse arc plasma have been separately diagnosed. A brief description of the apparatus in principle, structure, functions and applications is given in this paper together with the measurement results and error analysis for Ar+H_2 arc plasma.

关 键 词：电弧等离子体 光谱 诊断装置 微机 

分 类 号：O536[理学—等离子体物理]