溅射过程的Monte Carlo方法模拟计算  

COMPUTER SIMULATION OF SPUTTER PROCESS BY MONTE CARLO METHOD

作　　者：单慧波[1] 姜恩永[1] 李金锷[1] 

机构地区：[1]天津大学物理系

出　　处：《天津大学学报》1989年第2期107-112,共6页Journal of Tianjin University(Science and Technology)

摘　　要：运用Monte Carlo方法对溅射过程进行了模拟计算,其结果清楚地描述了溅射的微观过程,溅射产额的计算值与实验值吻合。This paper describes the computer simulation of sputter process on the binary collision model by the Monte Carlo method. The results show clearly the microscopic process of sputtering, and the calculation results of sputtering yield are in good agreement with those experiments.

关 键 词：溅射过程 MONTE Carlo 模拟计算 

分 类 号：TN305.92[电子电信—物理电子学]