沉积在α－Al＿2O＿3分形基底上Ag薄膜的特性  

CHARACTERISTICS OF Ag THIN FILMS DEPOSITED ON THE FRACTAL SUBSTRATES OF α-Al_2O_3 CERAMICS

作　　者：许宇庆[1] 叶高翔[1] 王劲松[1] 陶向明[1] 张其瑞[1] 

机构地区：[1]浙江大学物理系,杭州大学物理系

出　　处：《物理学报》1994年第7期1144-1151,共8页Acta Physica Sinica

摘　　要：报道了采用磁控溅射法在α－Ａｌ＿２Ｏ＿３分形基底上沉积Ａｇ薄膜表面的形貌、结晶状态以及其Ｖ－Ｉ特性．结果表明：分形的Ａｌ＿２Ｏ＿３基底导致Ａｇ薄膜具有起伏不平的结构、较差的结晶状态并且存在大量的孔洞，它们同样受基底温度和薄膜厚度的影响．在一定的厚度范围内，Ａｇ薄膜呈现反常的非线性Ｉ（Ｖ）特性，其行为也受薄膜厚度、基底温度和测试环境的强烈影响．he surface morphology and V-I characteristics of the Ag thin films depositedon the fractal substrates of a-Al_2O_3 ceramics by rf magnetron sputtering have beeninvestigated. The fractal surface morphology,poor crystallinity and abnormal nonli-near dc V-I behavior of the thin films have been observed.The crystallinity of thefilms deposited on the fractal substrates is improved by increasing the substratetemperature and the thickness of the thin film. The nonlinear V-I characteristicsare influenced by the thickness of the thin films,substrate temperature and measu-ring environment.

关 键 词：银 薄膜 分形薄膜 磁控溅射 

分 类 号：O484[理学—固体物理]