成膜参数对Au透明导电复合膜电性能的影响  

Effect of deposition parameters on performance of multilayer transparent conductive thin films

作　　者：纪建超[1] 沈玫[1] 颜悦[1] 

机构地区：[1]北京航空材料研究院,北京100095

出　　处：《真空》2005年第2期38-40,共3页Vacuum

摘　　要：介绍了用真空磁控溅射方法沉积的Au-氧化物透明导电复合膜,研究了沉积复合膜过程中,真空室温度、电压以及退火处理等因素对复合膜电性能的影响,研究表明复合膜的电阻呈正温度系数,电阻低值对应于适宜的电压,从而对改善复合膜的光学、电性能及物理机械性能提供了很好的思路。Discusses how the deposition parameters, such as the temperature in vacuum chamber, resistance, voltage and annealing process, affect the performance of the multilayer transparent conductive Au-oxide thin films prepared by way of vacuum magnetron deposition. The experimental results showed that the multilayer film presents a positive temperature coefficient and low resistance corresponding to appropriate voltage, thus providing a good idea to improve the photoelectrical and mechanical properties of such multilayer thin films.

关 键 词：复合膜 电阻 温度 电压 退火 

分 类 号：O484[理学—固体物理] TB43[理学—物理]