阳极真空弧沉积装置及弧特性初步诊断  

The Anodic Vacuum Arc Deposition Device and Preliminary Investigation of Arc Properties

作　　者：王瑞光[1] 苏晓东[1] 

机构地区：[1]烟台大学

出　　处：《烟台大学学报（自然科学与工程版）》1994年第2期23-27,共5页Journal of Yantai University(Natural Science and Engineering Edition)

摘　　要：介绍一种新的真空弧沉积实验装置。在１５～４０Ａ的电流范围内，对Ａ１弧等离子体的特性进行了初步诊断。在２５Ａ弧电流下，电子温度为０．４～０．８ｅＶ，电子浓度为１０１５～１０１７ｍ－３。A new vacuum arc deposition experimental device is intreduced in this paper.The properties ofAl arc plasma generated by anodic vacuum arc are investigated preliminarily in the current rangebetween 15 and 40A. The electron temperature range is within 0.4～0.8eV and the electron densi-ty is within 1015～1017m-3 at 25A arc current.

关 键 词：阳极 真空弧 沉积 等离子体 薄膜 

分 类 号：TB43[一般工业技术]