纳米级电子束曝光机用图形发生器  

Pattern Generator for Nanometer E-beam Lithography System

作　　者：刘伟[1] 方光荣[1] 顾文琪[1] 

机构地区：[1]中国科学院电工研究所,北京100080

出　　处：《微细加工技术》2005年第1期1-5,16,共6页Microfabrication Technology

基　　金：中国科学院知识创新工程重大项目资助(KGCX1-Y-8)

摘　　要：为满足纳米级电子束曝光系统的要求,设计了高速图形发生器。该图形发生器包括硬件和软件两部分。硬件方面主要是利用高性能数字信号处理器(DSP)将要曝光的单元图形拆分成线条和点,然后通过优化设计的数模转换电路,将数字量转化成高精度的模拟量,驱动扫描电镜的偏转器,实现电子束的扫描。通过图形发生器还可以对标准样片进行图像采集以及扫描场的校正。配合精密定位的工件台和激光干涉仪,还可以实现曝光场的拼接和套刻。利用配套软件可以新建或导入通用格式的曝光图形,进行曝光参数设置、图形修正、图形分割、临近效应修正等工作,完成曝光图形的准备。结果表明,该图形发生器能够与整个纳米级电子束曝光系统协调工作,刻画出纳米级的图形。The high speed Patten Generator is designed for nanometer E-beam lithography system. The Patten Generator is composed of both hardware and software. The Digital Signal Processor (DSP) is embedded in the hardware, so coordinates of exposure points inside the primitive shapes can be calculated with high speed. The beam scanning of SEM is controlled by two set of 16-bit digital to analog converters (DAC), namely X and Y DACs. The gain, rotation, and orthogonality of writing field can be corrected by users through image acquisition module. The Patten Generator can also control laser stage, and provide feedback to the deflection DACs, allowing field stitching better than 0.1 μm. Exposure data can be inputted in common E-beam formats, and new patterns can be created by users using host operational software. The Patten Generator has been successfully used in E-beam lithography system, and nano writing patterns are obtained.

关 键 词：图形发生器 电子束曝光机 纳米 

分 类 号：TN305.7[电子电信—物理电子学]