极紫外光刻真空工件台技术研究  

Research on Vacuum Stage Technologies for Extreme Ultraviolet Lithography

作　　者：朱涛[1] 李艳秋[1] 

机构地区：[1]中国科学院电工研究所,北京100080

出　　处：《微细加工技术》2005年第1期32-37,共6页Microfabrication Technology

基　　金：中国科学院"引进国外杰出人才基金"2001年资助项目(20011215);国家863MEMS重大专项基金资助项目(2003AA404150)

摘　　要：在极紫外光刻系统中,真空工件台的运行精度、速度、加速度以及动态定位和扫描同步性能是影响整机成像质量、套刻精度和产率的重要因素。结合极紫外光刻机的工作原理和发展现状,论述了极紫外光刻机真空工件台系统的特征、组成及其关键技术。Vacuum stage is a key subsystem of Extreme Ultraviolet Lithography. Its accuracy, velocity, acceleration, as well as dynamic positioning and synchronous scanning performances affect the image quality, overlay accuracy and throughput of the whole machine greatly. Based on the working principles and state-of-the-art developments of EUVL, the characteristics, construction and key technologies for vacuum stage system of EUVL are investigated.

关 键 词：极紫外光刻机 工件台 真空 控制 

分 类 号：TN305.7[电子电信—物理电子学]