纳米多孔薄膜孔结构的非破坏性表征  

Non-destructive characterization of pore structure in nanoporous low k dielectric films

作　　者：王娟[1] 张长瑞[1] 冯坚[1] 

机构地区：[1]国防科技大学航天与材料工程学院新型陶瓷纤维及其复合材料国防科技重点实验室,湖南长沙410073

出　　处：《功能材料》2005年第4期481-486,共6页Journal of Functional Materials

基　　金：国防预研资助项目(41312040307)

摘　　要：对纳米多孔低介电常数薄膜孔洞率、孔径、孔径分布和孔洞连通性等孔结构的表征有助于理解薄膜的结构和提高其性能。近年来开展了利用与特殊X射线反射联用的小角中子散射、小角X 射线散射、椭偏测孔仪、正电子湮没谱和表面声波谱等非破坏性方法表征多孔低介电常数薄膜孔结构的研究。介绍了这些方法的基本原理,综述了利用这些方法研究低介电常数介质薄膜及其集成工艺的进展,总结了这些方法表征多孔薄膜孔结构的特征。Characterization of the pore structure,such as porosity,pore size,pore size distribution and pore interconnectivity in nanoporous low k dielectrics films helps to better understand the structure and improve their properties.Small angle neutron and X-ray scattering (SANS,SAXS) combined with specular X-ray reflectivity (SXR),ellipsometric porosimetry (EP),positron (positronium) annihilation spectroscopy (PAS) and surface acoustic wave spectroscopy (SAWS) have recently been developed for this.The principles and physical models related to the pore structure of these non-destructive methods were introduced.The applications of these methods related to pore structure of porous low k films and Cu/low k films integration were reviewed.The characteristics of these methods were summarized.

关 键 词：纳米多孔薄膜 低介电常数介质薄膜 小角中子散射 椭偏测孔仪 正电子(素)湮没寿命谱 

分 类 号：O484.5[理学—固体物理] O484.8[理学—物理]