泄漏波导法精确测量薄膜参数的理论和实验研究  

Theoretical and Experimental Analysis for Measuring the Refractive Index and Thickness of a Film in a Leakage Waveguide

作　　者：肖丙刚[1] 宋军[1] 何赛灵[1] 

机构地区：[1]浙江大学现代光学仪器国家重点实验室

出　　处：《光子学报》2005年第4期586-589,共4页Acta Photonica Sinica

基　　金：国家自然科学基金项目(60377022)资助

摘　　要：对泄漏波导法测量薄膜折射率和厚度的实验方法做了介绍,基于四层介质结构的理论模型,通过严格的电磁场理论推导出了测量方法依据的本征色散方程,并使用了Newton Raphson方法求解复传播常数,保证了测量的精确与快捷 以等离子增强化学气相沉积法生长的SiO2 薄膜为例,对其折射率和厚度进行了测定 实验证明,本文方法与传统方法相比,不仅具有更高的测量精度,而且数据处理更加快捷,完成一片样品测试。An accurate method for measuring the refractive index and thickness of a dielectric film in a leakage waveguide is presented in details. The dispersion equation of a four-layers structure is derived. The complex propagation constant is determined with the Newton-Raphson numerical method. With the dispersion equation derived above, the method for measuring the optical parameters of the single-layer is presented. As an example, the refractive index and thickness of the single-layer silica film deposited with Plasma Enhanced Chemical Vapor Deposition are determined by the present method. The result shows that the present method is accurate and fast compared with the traditional method. To determine the parameters of a sample, a personal computer only spends 60 ms using the present method.

关 键 词：导波光学 泄漏波导 色散方程 Newton-Raphson方法 

分 类 号：TN256[电子电信—物理电子学]