高级次反射膜空间解复用器件的设计  

Design of high-level reflectivity thin film spatial demultiplexer

作　　者：金波[1] 陈海星[1] 章岳光[1] 顾培夫[1] 刘旭[1] 

机构地区：[1]浙江大学现代光学仪器国家重点实验室,浙江杭州310027

出　　处：《浙江大学学报（工学版）》2005年第4期475-477,486,共4页Journal of Zhejiang University：Engineering Science

基　　金：国家自然科学基金资助项目(60078001).

摘　　要：为了降低多周期高反射膜空间解复用器的制备工艺难度,根据“超棱镜”效应的多层薄膜空间解复用器的设计方法,提出了一种制备工艺简单的多层薄膜结构.通过增加周期中单层膜的级次来减少整个高反射膜系的周期数.所设计的高级次反射膜结构为10(9H9L)9H,对设计的膜系进行了数值模拟计算,并和相同总物理厚度的一级次高反射膜系进行了比较.计算结果表明,该设计方法明显降低了对制备工艺的要求,并具有大的空间色散和实际制备意义.A new design method for multilayer thin film spatial demultiplexer based on Superprism phenomenon of periodic photonic crystal was presented. Without complex techniques the multilayer thin film structure was deposited easily with increasing the thickness of the single layer and decreasing the periodicity. The high-level reflectivity thin film stack as 10(9H9L)9H was designed. By the above method and compared with the classic low-level high reflectivity thin film stack of the same geometric thickness, the numerical simulation and the computational results show that the spatial dispersion is large and the designed multiplayer structure is more feasible in practice for fabrication.

关 键 词：薄膜 解复用器 高反射膜 空间色散 

分 类 号：TN252[电子电信—物理电子学] O484[理学—固体物理]