薄膜表面不平度对厚度测试准确度影响的研究  

Influence of Surface Unevenness on Thickness Measu rement Precision of Thin Film

作　　者：孙艳[1] 赵宏[1] 王昭[1] 

机构地区：[1]西安交通大学机械工程学院

出　　处：《半导体光电》2005年第2期112-114,共3页Semiconductor Optoelectronics

摘　　要：在用反射干涉频谱法(Rifs)测量薄膜厚度的过程中,使用“Y”型光纤作为传光的媒介,光纤测试端发射出的光照射到薄膜上,反射光又回到了该光纤中。对反射光进行频谱分析可以计算出薄膜测试处的厚度。由于是光学非接触式测量,而光束又有发散性,所以薄膜的表面不平度以及光纤相对于薄膜的位置直接影响测试的准确度。对该现象的研究表明:为提高测试准确度,必须尽量减少光纤的有效照射面积,以及保证薄膜基底的光滑,给出了具体方法。为保证薄膜上的反射光束能够回到光纤内部而不丢失厚度信息,给出了薄膜微观倾斜的极限角度。给出了光纤测试薄膜中“平均厚度”和“有效照射面积”的构想。In the process of detecting the thickness of thin film with Rifs (Reflectometric interference spectroscopy) method, a 'Y' type bifurcated optical fiber was used, light was sent through optical fiber to film and was received by the same fiber, film thickness can be measured in terms of reflected spectrum analysis. Because of the untouched method and emanative light beam, the surface unevenness of film and the position between optical fiber and film directly affect the detecting precision. The analysis result shows that reducing the effective illumination area of fiber and ensuring the slick of film base can improve the detecting precision. To ensure that reflected light can back to fiber without losing thickness information, ultimate angle of film surface incline was given. The conceptions of 'average thickness' and 'effective illumination area' are given in detail.

关 键 词：反射干涉光谱法 薄膜 光纤 表面 

分 类 号：O433[机械工程—光学工程]