射频反应磁控溅射制备氧化铬薄膜技术及性能  

Deposition technology and properties of chromium oxide coatings by RF reactive sputtering

作　　者：熊小涛[1] 阎良臣[1] 杨会生[1] 王燕斌[1] 

机构地区：[1]北京科技大学材料物理与化学系,北京100083

出　　处：《北京科技大学学报》2005年第2期205-208,212,共5页Journal of University of Science and Technology Beijing

基　　金：国防科学技术委员会资助项目(No.MKPT-0475)

摘　　要：研究了采用射频反应溅射方法制备氧化铬耐磨镀层的技术和薄膜的性能.结果表 明,采用金属靶材进行射频反应溅射时,由于靶材与反应气体的反应,会出现两种溅射模式, 即金属态溅射和非金属态溅射,非金属态溅射模式的沉积速率很低.氧化铬薄膜的硬度主要 决定于薄膜中Cr2O3含量,在供氧量不足时会生成低硬度的CrO,制备高硬度氧化铬薄膜需要 采用尽可能高的氧流量进行溅射.采用在基片附近局域供氧,可以实现高溅射速率下制备出 高硬度的氧化铬薄膜.The RF reactive sputtering method was used to deposit wear resistant chromium oxide coatings and the properties of the coatings were studied. The results showed that there existed two modes of sputtering during RF reactive sputtering, i.e., metal sputtering mode and nonmetal sputtering mode caused by the reaction between the target and reactive gas. The deposition rate was very low in the nonmetal sputtering mode. The hardness of chromium oxide coatings depends mainly on the content of Cr2O3 in the coatings and low hardness CrO will form when oxygen is not enough during sputtering. Feeding oxygen near the substrate is an efficient technology for depositing hard chromium oxide coatings at high deposition rate.

关 键 词：氧化铬 薄膜 磁控溅射 力学性能 

分 类 号：TG174.44[金属学及工艺—金属表面处理] O484.4[金属学及工艺—金属学]