重氮树脂与银纳米颗粒自组装膜的图像化  

Patterning of Self-assembly Films Fabricated from Mercaptoacetic Acid Capped Ag Nanoparticles and Diazoresin

作　　者：白硕[1] 鲁从华[1] 曹维孝[1] 

机构地区：[1]北京大学化学与分子工程学院,北京100871

出　　处：《化学学报》2005年第9期866-868,i004,共4页Acta Chimica Sinica

基　　金：国家自然科学基金(No.20274002)

摘　　要：从巯基乙酸包覆的银纳米颗粒(MA-AgNP)和重氮树脂(DR)由自组装方法,制备了感光性的超薄膜.在掩模(photomask)覆盖下对膜进行选择性曝光和紧接着的十二烷基硫酸钠水溶液显影,未光照部分的膜被显影液完全洗脱,而光照部分的膜不能洗脱,从而形成清晰的图像.用AFM和SEM对图像进行了表征.The Photosensitive self-assembly ultra-thin films have been fabricated from mercaptoacetic acid capped Ag nanoparticles (MA-AgNP) and diazoresin (DR). Under selective UV irradiation through a photomask and instantly developing in sodium dodecyl sulfate (SDS) aqueous solution the unirradiated parts of the film were removed completely and the irradiated parts of the film were kept. As a result a clear micropattern of the film was obtained. The fine micropatterns were characterized by AFM and SEM.

关 键 词：银纳米颗粒 重氮树脂 自组装膜 图像化 十二烷基硫酸钠 组装方法 巯基乙酸 水溶液 超薄膜 感光性 显影液 SEM AFM 洗脱 光照 

分 类 号：O621[理学—有机化学]