半导体光催化氧化的机理及实践应用  

The Principium and Application of Photocatalytic Oxidation With Semiconductors

作　　者：智勇 

机构地区：[1]大连尘远环保科技有限公司,辽宁大连116023

出　　处：《鞍山师范学院学报》2005年第2期35-40,共6页Journal of Anshan Normal University

摘　　要：综述了半导体光催化氧化法的基本原理,概括了影响光催化氧化反应的各个因素及提高反应速率的各种方法,介绍了应用该方法处理水污染物的研究现状,并对光催化氧化法的发展前景及研究方向作了简单阐述.In this paper,the prin cipium of photocatalytic oxidation using semiconductors is summarized.The factors which affect the photocatalytic oxidation and the methods which can improve the velocity of reactions are also generalized. On the other hand,the application in purifying polluted water with photocatalytic oxidation on its prospective development are introduced.

关 键 词：光催化氧化 反应速率 水污染物 

分 类 号：X-1[环境科学与工程]