多层膜[Co_(85)Cr_(15)/Pt]_(20)的磁性、垂直磁记录特性和微结构的关系  

Correlation among magnetic properties, perpendicular magneticrecording properties and microstructure of[Co_(85)Cr_(15) /Pt]_(20) multilayers

作　　者：黄阀[1,2] 李宝河[1,3] 杨涛[1] 翟中海[1] 朱逢吾[1] 

机构地区：[1]北京科技大学材料物理与化学系 [2]金日成综合大学物理系,朝鲜平壤 [3]北京工商大学数理部,北京100037

出　　处：《物理学报》2005年第4期1841-1846,共6页Acta Physica Sinica

基　　金：国家自然科学基金 (批准号 :5 0 3 0 10 0 2 );北京市科技新星计划 (批准号 :H0 2 0 82 12 90 12 0 )资助的课题~~

摘　　要：采用磁控溅射法制备了性能优良的以Pt为缓冲层的 [Co85Cr1 5 Pt]2 0 多层膜 ,研究了溅射气压对 [Co85Cr1 5 Pt]2 0 多层膜微结构和磁性的影响 .研究结果表明 ,Ar溅射气压对 [Co85Cr1 5 Pt]2 0 多层膜的微结构、垂直磁各向异性和矫顽力有重要的影响 .所有样品的有效各向异性常数Keff>0 ,具有垂直磁各向异性 .随着Ar气压增加 ,样品垂直膜面的矫顽力增加 ,但样品有效磁各向异性常数减小 .在 1 6PaAr溅射的Pt(2 0nm) [(Co85Cr1 5(0 5nm) Pt(1 5nm) ]2 0 多层膜 ,矫顽力达到 130kA m ,具有垂直各向异性 ,可作为垂直磁记录介质 .原子力显微镜照片显示 ,随着Ar气压增加 ,表面平均晶粒尺寸和粗糙度均增加 .这是导致多层膜的垂直矫顽力增加和有效磁各向异性常数减小的原因 .The [Co85Cr15/Pt](20) multilayers with Pt underlayers were prepared by magnetron sputtering and the effects of sputtering gas pressure on microstructure and magnetic properties Of [Co85Cr15/Pt](20) multilayers were studied. The results show that sputtering Ar gas pressure has a great effect on the microstructure, perpendicular magnetic anisotropy and the coercivity of [Co85Cr15/Pt](20) multilayers. For all samples, we have the effective magnetic anisotropy constant K-eff > 0, and all samples showed perpendicular magnetic anisotropy. With increasing sputtering Ar gas pressure, the perpendicular and in-plane coercivity of the samples increase, but the effective magnetic anisotropy constant decreases. The coercivity of Pt(20 nm)/[( Co85Cr15 (0.5 nm)/Pt(1.5 nm)](20) multilayers sputter-depositied at 1.6 Pa Ar gas pressures is increased to 130 kA/m. The Pt(20 nm)/ [(Co85Cr15(0.5 nm)/Pt(1.5 nm)](20) multilayers display perpendicular magnetic anisotropy and can be used as perpendicular magnetic recording media. The images of atomic force microscopy show that both average grain size and the surface roughness increase with increasing sputtering Ar pressure, which leads to the enhancement of perpendicular coercivity and the decrease of effective magnetic anisotropy constant.

关 键 词：多层膜 垂直磁记录 磁控溅射 微结构 矫顽力 

分 类 号：TB383[一般工业技术—材料科学与工程]