射频等离子体处理对TiO_2薄膜光电转换和亲水性的影响  

Photo-electrical Performance of TiO_2 Thin Films by Ar Plasma Treatment

作　　者：韩俊波[1] 王念[1] 于国萍[1] 魏正和[1] 钟家柽[2] 王取泉[1] 周正国[1] 

机构地区：[1]武汉大学物理科学与技术学院,湖北武汉430072 [2]武汉大学化学与分子科学学院,湖北武汉430072

出　　处：《液晶与显示》2005年第3期205-209,共5页Chinese Journal of Liquid Crystals and Displays

基　　金：湖北省自然科学基金资助项目(No.202130626)

摘　　要：用反应射频溅射法在导电玻璃上制备TiO2薄膜,并用Ar射频等离子体对TiO2薄膜进行处理。利用XRD、XPS、UVVIS透射光谱和AFM等测试手段研究Ar射频等离子体处理对TiO2纳米薄膜的结构、成分和光电性能的影响,用液滴形貌分析法测量水滴在TiO2薄膜表面的接触角。经过Ar射频等离子处理后,用TiO2薄膜组装的光电池的光电流提高了约80%,TiO2薄膜的亲水角由66°左右迅速减小。Nanocrystalline TiO_2 thin films were prepared by reactive RF sputtering, then the samples were treated by Ar radio frequency plasma. The effect of Ar plasma treatment on crystal structure, component, absorption spectra and photo-electrical performances of TiO_2 films were investigated by using XRD,XPS, UV/VIS spectrophotometers and AFM, the contact angles of water-drop on the surface of TiO_2 films were measured by using drop shape analysis. With the treatment of plasma, the photo-currents of the cells assembled with sputtering TiO_2 thin films increased by 80 %, the contact angle of water on the surface of TiO_2 films decreased rapidly from about 66 ° to a small degree .

关 键 词：等离子体处理 射频溅射 光电转换 亲水性 TIO2 纳米晶 

分 类 号：O484.4[理学—固体物理]