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作 者:高鹏[1] 徐军[1] 邓新绿[1] 王德和[1] 董闯[1]
机构地区:[1]大连理工大学三束材料改性国家重点实验室,大连116024
出 处:《物理学报》2005年第7期3241-3246,共6页Acta Physica Sinica
基 金:国家自然科学基金(批准号:50390060和50135040)资助的课题.~~
摘 要:利用微波ECR全方位离子注入技术,在单晶硅(100)衬底上制备类金刚石薄膜.分析结果表明,所制备的类金刚石碳膜具有典型的类金刚石结构特征,薄膜均匀、致密,表面粗糙度小,摩擦系数小.其中,薄膜的结构和性能与氢流量比关系密切,随氢流量比的增加,薄膜的沉积速率减小,表面粗糙度降低,且生成sp3键更加趋向于金刚石结构,表面能更低,从而使摩擦系数大幅降低.Diamond-like carbon(DLC) films were prepared on silicon (100) wafer by microwave electron cyclotron resonance(MW-ECR) plasma source ion implantation( PSII). The results showed that the films had typical properties of DLC. The films was dense and homogeneous, and the roughness and friction coefficient was low. The connection between the properties of the films and the flow ratio of hydrogen was closely. With the increase of the flow ratio of hydrogen to methane, the deposition rate and the roughness of the films decreased. The sp(3) bond obtained was more likely diamond like, which had low surface energy, consequently making the friction coefficient of the films decrease rapidly.
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