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作 者:王晓阳[1] 徐艳梅[1] 张春平[1] 李静[1] 莫越奇[2] 吴宏滨[2] 曹镛[2] Yu Gang
机构地区:[1]南开大学物理学院 [2]华南理工大学高分子光电材料与器件研究所 [3]UNIAX Corporation/DuPont Displays Santa Barbara,California 93117
出 处:《光子学报》2005年第5期746-749,共4页Acta Photonica Sinica
基 金:国家自然科学基金项目(No.60278007;No.60025512)资助
摘 要:测量了由修正的Gilch方法制作的MEH -PPV薄膜的反射光谱,对于玻璃基底对反射谱的影响做了修正 利用了修正后的反射谱进行了kk变换,获得了薄膜的折射率n 再用计算所得的数据反算出薄膜的反射率与测量的反射谱是一致的,获得的折射率随波长的变化与测量的吸收谱是相对应的,对所得结果进行了误差分析。MEH-PPV film is a kind of conjugated polymers synthesized by modified Gilch route. The reflection spectrum of MEH-PPV film was measured by the UV-365 spectrophotometer, which is not exact result of the film because of the reflection of glass substrate. A similar formula annulled the influence of the glass was given, and in this way modified reflection spectrum was figured. With the data of the modified spectrum and the Kramas-Kronig relation, the refraction index of MEH-PPV as a function of wavelength was given. The reflection spectrum is calculated by the Fresnel formulae and the calculated refraction index data in order to compare the measured result of reflection spectrum with the computed result, in which little errors resulted from the method of calculation and the influence of the glass substrate are shown. In addition, the measured absorption spectrum shows a broad peak from 450 nm to 600 nm approximately corresponding to the peak of the curve of refraction index at 550 nm. From those results the calculated refraction indexes are basically reasonable and exact.
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