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作 者:刘鹏[1] 刘玉玲[1] 贺银波[1] 余飞鸿[1]
机构地区:[1]浙江大学光电系现代光学仪器国家重点实验室,浙江杭州310027
出 处:《光电工程》2005年第6期93-96,共4页Opto-Electronic Engineering
摘 要:根据薄膜光学计算理论和最优化理论,提出了用自适应模拟退火法结合共轭梯度法确定薄膜厚度的新方法。该方法建立的数学模型先采用自适应模拟退火算法搜索,再采用共轭梯度算法精确查找。它不但减少了无损伤测量方法对初始计算条件的过多依赖,而且在保证精确度的情况下极大地提高了计算速度,同时有很高的适应性。实验中,应用该方法求解了三层膜系的厚度,计算时间为3s,计算误差小于4nm。According to the theories of thin film calculation and optimization, a new method for determining the thickness of thin film using Adaptive Simulation Annealing (ASA) algorithm and Conjugate Gradient (CG) algorithm is brought out. The mathematical model set up with this method searches cursorily with ASA and then search accurately with CG. This method reduces the dependence of non-contact inspection on initial conditions, raises the calculating speed obviously with high accuracy and adaptability. During experiment, the thickness of 3-layer thin film was calculated in 3 seconds with calculation error less than 4 nm.
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