脉冲离子镀膜中的脉冲计数  

The counting of the pulse in the pulsed vacuum arc deposition

作　　者：弥谦[1] 樊超[1] 舒朝濂[1] 

机构地区：[1]西安工业学院光电工程学院,西安710032

出　　处：《西安工业学院学报》2005年第1期28-31,共4页Journal of Xi'an Institute of Technology

基　　金：陕西省教育厅重点实验室项目 (0 4J52 5)

摘　　要：　在脉冲真空电弧离子镀膜过程中,膜层厚度的控制至关重要.由其镀膜机理可知,膜层厚度与脉冲放电次数之间成线性正比关系,可以通过对脉冲放电次数进行计数的方法达到控制膜层厚度的目的.然而,脉冲计数的准确性受到很多因素的影响,分析认为主要是由外界电磁干扰和多斑点的产生引起计数的不准确.为此,采用了加入延时电路的方法提高计数的准确性.实验表明,采用这种计数电路减少计数误差是可行的,并能将误差控制在5%的范围内,能够很好的满足薄膜沉积的工艺要求.It's very important to control the thickness of the film in the process of the pulsed vacuum arc deposition (PVAD).Based on the principle of the PVAD,the thickness of the film is linearly direct ratio with the number of the pulse,thus,the thickness can be controlled by counting the number.But,the accuracy of the count is affected by many factors,mainly by the interference of the external electromagnetic waves and the generation of the multi cathode spots.To resolve that,a delay circuit is introduced.The experiment results show that this method is feasible and the error of the counting is less than 5% by using this circuit,and it is enough to meet the technologic requirements of the deposition.

关 键 词：脉冲真空电弧离子镀膜 脉冲计数 误差 延时电路 

分 类 号：TB43[一般工业技术]