圆柱形衬底上高质量金刚石薄膜制备工艺研究  

Study on Fabrication of High Quality Diamond Thin Films on Cylindrical Substrate

作　　者：马玉平[1] 王勇[1] 孙方宏[1] 陈明[1] 

机构地区：[1]上海交通大学机械与动力工程学院,上海200030

出　　处：《金刚石与磨料磨具工程》2005年第3期26-29,共4页Diamond & Abrasives Engineering

基　　金：国家自然科学基金项目(50275095;50475026)国家863计划项目(2002AA302613)

摘　　要：本文以丙酮和氢气为气源,采用优化钽丝排列分布的偏压增强热丝CVD装置对钨丝衬底进行了金刚石薄膜沉积研究。采用扫描电镜(SEM)、拉曼(Raman)光谱等方法检测了金刚石薄膜的质量,分析了沉积工艺对金刚石形核和生长的影响。研究结果分析表明,当直径为1mm的钨丝与热丝之间的最佳距离为4-6mm且反应压力为4665.5Pa、碳源浓度为1.8%时可得到涂层厚度均匀又能覆盖整个钨丝外表面的高质量金刚石薄膜,为以后的自支撑的金刚石薄膜管的制备和回转体刀具的外表面金刚石涂层打下基础。The study on deposition of diamond thin films on tungsten wire substrate with the gas mixture of acetone and hydrogen by using bias enhanced hot filament CVD with the tantalum wires being optimized arranged was carried out. The quality of diamond film was tested by SEM, Raman spectrum, etc. The effect of deposition technique on the nucleation and growth of diamond crystals was analyzed. The results showed that when the optimal distance between tungsten wire and hot filaments is from 4 to 6 mm, reaction pressure is 4665. 5Pa, the acetone concentration is 1. 8vol. % ,the cylindrical diamond thin films with good quality and uniform thickness can be obtained on tungsten wires with a diameter of 1mm by using bias enhanced hot filament CVD, which laid a foundation for the subsequent fabrication of self - supported diamond tubes and deposition of diamond coatings on the rotating tools.

关 键 词：金刚石薄膜 偏压增强热丝CVD法 圆柱形衬底 高质量 

分 类 号：TG174.4[金属学及工艺—金属表面处理]