MIM隧道发光结表面形貌分析  

Analysis of Surface Topography of MIM Light-emission Tunneling Junctions

作　　者：刘柯林[1] 蔡益民[1] 孙承[1] 高中林[1] 王林[1] 

机构地区：[1]东南大学电子工程系,东南大学吴健雄实验室

出　　处：《固体电子学研究与进展》1994年第4期377-380,共4页Research & Progress of SSE

摘　　要：简介金属－绝缘层－金属（ＭＩＭ）隧道结的基本结构、工艺流程及发光机理。利用原子力显微镜（ＡＦＭ）观察ＭＩＭ隧道结的表面形貌，发现结表面存在规则有序的自然粗糙度。根据ＡＦＭ照片估计粗糙度尺寸，再利用小金属颗粒隧道结的偶极子共振发射天线理论，计算结发光光谱峰值，理论与实验符合较好。In this paper, we briefly introduce MIM tunneling junctions basic structure, technology and their light-emission mechanism. With the help of the atom force microscope (AFM), we observed the junction surfaces and found that there exists semisphere-formed roughness in regular arrangement on the surface.We estimated the size of the semisphere roughness by the AFM photos and calculated the light emission peaks of the junctions by the dipole resonant emission theory.The results of experiment agree with the theory quite well.

关 键 词：MIM 隧道结 偶极子共振发射 粗糙度 分析 

分 类 号：TN386.6[电子电信—物理电子学] TN305.2