镍铬合金薄膜的研究进展  

Research Progress in Ni-Cr Alloy Thin Film

作　　者：周继承[1] 田莉[1] 

机构地区：[1]中南大学物理科学与技术学院,长沙410083

出　　处：《材料导报》2005年第7期5-7,15,共4页Materials Reports

基　　金：国家自然科学基金项目(60171043;60371046)

摘　　要：镍铬合金薄膜是重要的精密电阻和应变电阻薄膜材料。简述了镍铬合金薄膜的3种制备方法:真空蒸发沉积、磁控溅射沉积和离子束沉积;讨论了基底、工作气压、沉积时间等薄膜制备工艺参数以及退火工艺对薄膜性能的影响。重点叙述了镍铬合金薄膜、改良型镍铬合金膜、含氯镍铬合金膜、镍铬合金多层膜和纳米镍铬合金薄膜等膜系的特征。阐明了制备具有高电阻率、低电阻温度系数、高应变灵敏系数、良好的热稳定性等优异综合性能的镍铬合金薄膜的新工艺发展趋势。Ni Cr alloy films are playing an increasingly important role in the fabrication of accurate resistor and piezoresistive thin film.Three physical vapor deposition(PVD)techniques of vacuum deposition,magnetron sputte- ring,and ion beam deposition are simply introduced in this article.Influence of suhstrate,deposition parameters of work- ing pressure,deposition time,and annealing on properties of films is also discussed.The Ni-Cr alloy films,modified Ni- Cr alloy film Ni-Cr multilayer,Ni-Cr-N film and Ni Cr nanocomposite film are reviewed with discussion focusing on their characteristics,development,and fabrication techniques.The trend of new technique for manufacturing Ni-Cr alloy thin film with a combination of characteristics:high resistivity,low temperature coefficient of resistance(CR),large gauge factor,and good thermal stability is presented.

关 键 词：镍铬合金薄膜 制备工艺与设备 精密电阻 电阻应变计 电学性质 

分 类 号：TB79[一般工业技术—真空技术]