红外激光薄膜表面缺陷研究  

Study on the Surface Defect Desity of Infrared Laser Thin Film

作　　者：张耀平[1] 许鸿[1] 凌宁[1] 张云洞[1] 

机构地区：[1]中国科学院光电技术研究所

出　　处：《应用激光》2005年第3期165-168,160,共5页Applied Laser

基　　金：国家863课题资助项目

摘　　要：薄膜缺陷是影响红外激光薄膜元件抗激光损伤的重要因素之一,长期以来一直是人们关注和研究的问题。本文介绍了红外激光薄膜缺陷的种类、特点及成因,在此基础上,分析了不同厂家镀膜材料与不同镀膜速率对薄膜表面缺陷密度的影响,并且得出了镀制激光薄膜所需的合适材料与速率,最后利用有限元方法对典型的节瘤与陷穴缺陷受激光作用进行了模拟分析,结果表明:节瘤缺陷种子深度小且直径大的缺陷产生的温升与应力较大,陷穴缺陷随直径增大,其产生的温升与应力也较大。Defects in thin film are one of the most important factors influencing laser-induced damage in the infrared laser thin film components, and always a major concern. Species, properties and derivation of defects in infrared laser thin film are introduced firstly in this paper. Then, the influence of the materials and evaporation rate from different factories on the surface defect density of laser thin film is analyzed. Finally, this paper put forward the appropriate material and evaporation rate of thin film. Finally, The nodule and concave hole defect are simulated by FEA, and result shows that temperature and stress is larger for nodule defect with large diameter and little depth and for concave hole with large diameter.

关 键 词：激光薄膜 表面缺陷 红外激光 薄膜缺陷 有限元方法 激光损伤 薄膜元件 缺陷密度 薄膜表面 镀膜材料 模拟分析 激光作用 缺陷产生 速率 陷穴 节瘤 应力 温升 直径 

分 类 号：TN244[电子电信—物理电子学] TG335.56[金属学及工艺—金属压力加工]