三价铬离子在电沉积过程中的形态  

Species of Trivalent Chromium in the Bath for the Electrodeposition of Chromium

作　　者：张新[1] 李惠东[1] 段淑贞[1] 孙根生[1] 刘新宇[1] 

机构地区：[1]北京科技大学物理化学系,北京科技大学化学系

出　　处：《北京科技大学学报》1995年第6期580-583,共4页Journal of University of Science and Technology Beijing

基　　金：国家自然科学基金

摘　　要：研究证明三价铬离子在ＨＣｌ体系中适应电活性物质是［Ｃｒ（Ｈ＿２Ｏ）＿６］￣（３＋），不同ｐＨ通过溶液中的存在形态而影响Ｃｒ￣（３＋）电沉积过程。同时证实了Ｃｒ￣（３＋）在ＨＣＯＯＨ或（ＮＨ＿２）＿２ＣＯ存在时不与三价铬形成配位化合物。The species of the trivalent ions of chromium in the HCl containing systems have been studied. The proper electroactive species was found to be[Cr(H2O)6](3+). The electrodepostion of chromium was found to be strongly affected by the pH of the bath due to the different species of trivalent chromium at different pH, and coordination compounds of Cr(3+) with HCOOH or(NH2)2 CO were not found.

关 键 词：电沉积 配位化合物 极谱曲线 铬离子 电镀 

分 类 号：TQ153.11[化学工程—电化学工业]