高温超导薄膜的一种混刻技术  

A WET ETCHING TECHGNOLOGY FOR HIGH TEEMPERATURE SUPERCONDUCTING THIN FILMS

作　　者：康琳[1] 郑延斌[1] 孙志坚[1] 吉争鸣[1] 

机构地区：[1]南京大学

出　　处：《低温物理学报》1995年第1期44-47,共4页Low Temperature Physical Letters

摘　　要：本文介绍了一种高温超导薄膜表面图形成型的化学湿法刻蚀技术，实验采用饱和乙二胺四乙酸（ＥＤＴＡ）、３％Ｈ３ＰＯ４和饱和ＮＨ４Ｃｌ三种溶液作为腐蚀液，分别对几组ＹＢＣＯ膜样品进行刻蚀，实验中井向腐蚀液和清洗液（去离子水）中通入干燥Ｎ２气．文中给出了测试数据，分析比较了样品刻蚀前后的Ｔｃ，摸索出一种在小尺寸微桥的光刻中对样品超导性能影响最小的化学湿刻技术．Abstract This paper reports awet etching technic for the pattern of high-Tc superconducting thin film.The solutiond of 3%H3PO4 and saturaced solutiond of EDTA and NH4Clare used as the etchants .The samples YBCO high-Tc superconducting thin film are etched with the egtching solution .Both etching and rinse solution were 'degassed 'bybubbling N2 through them during the etching and rinse procdures .The results show that Tc degradation can be further reduced by select ing the appropriate etchants

关 键 词：超导薄膜 湿刻技术 高TC 

分 类 号：TN05[电子电信—物理电子学] TM26[一般工业技术—材料科学与工程]