使用平行束软X光透镜的深亚微米X射线光刻  

A deep sub-micron X-ray lithography by using a soft parallel beam X-ray lens

作　　者：颜一鸣[1] 王大椿[1] 赫业军[1] 杨存耿 张胜基[1] 刘安东[1] 

机构地区：[1]北京师范大学低能核物理研究所,北京市辐射中心

出　　处：《光学精密工程》1995年第4期62-65,共4页Optics and Precision Engineering

基　　金：中国航天总公司资助项目

摘　　要：使用本实验室研制的整体平行束软Ｘ光透镜作为准直器和电子枪软Ｘ光源相配，作成了平行束软Ｘ光源，用此平行束软Ｘ光源进行了深亚微米Ｘ射线光刻实验．刻出了１．０μｍ～０．２μｍ的线条．文中对实验装置和光刻结果作了简要的介绍。With combination of a parallel beam soft X-ray lens used as an X-ray beam collimatorand an electron gun soft X-ray generator,a parallel soft X-ray source was developed for deepsubmicron X-ray lithography in the X-ray laboratory of Beijing Normal university.A testinglithography experiment was carried out by using this source and 0.2 1.0μm lines wereobserved.The experimental setup and preliminary resuIts of X-ray lithography is describedbriefly in this report.

关 键 词：X射线 平行束软X光 透镜 软X射线光刻 

分 类 号：TN305.7[电子电信—物理电子学] O434.19[机械工程—光学工程]